The National Institute of Advanced Industrial Science and Technology (AIST), affiliated with the Ministry of Industry, will set up a domestic research and development base for equipment for the production of semiconductors and chip materials, it was announced on Tuesday.
It is the first Japanese research institute to introduce equipment for extreme ultraviolet lithography, which is crucial for reducing the line widths of chip circuits.
The institute wants to get technical cooperation from the American technology giant Intel to increase the competitiveness of the Japanese chip industry.
The new AIST base, to be built in three to five years, is expected to include a system that will allow companies to conduct experiments using extreme ultraviolet lithography equipment for a fee. Measures are also being considered to develop semiconductor-related personnel through exchanges with foreign research institutes.
Intel will provide expertise in chip manufacturing using extreme ultraviolet lithography technology. It apparently hopes to pursue potential partnerships in manufacturing equipment and semiconductor materials, areas seen as strengths of Japanese manufacturers.
Intel began accelerating collaboration with Japanese companies this year, setting up a research and development organization with Omron and others for the assembly and testing process of chip manufacturing, with the goal of developing and testing equipment needed for automation.
